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dc.contributor.authorHatay, I.
dc.contributor.authorGup, R.
dc.contributor.authorErsöz, M.
dc.date.accessioned2020-11-20T16:47:14Z
dc.date.available2020-11-20T16:47:14Z
dc.date.issued2006
dc.identifier.isbn8086059456
dc.identifier.isbn9788086059457
dc.identifier.urihttps://hdl.handle.net/20.500.12809/5841
dc.descriptionHexion Specialty Chemicals;Mitsubishi Chemical Corporation;CS Cabot;Zentiva;BorsodChem MCHZen_US
dc.descriptionCHISA 2006 - 17th International Congress of Chemical and Process Engineering, 27 August 2006 through 31 August 2006, Prague, 70283en_US
dc.description.abstract[No abstract available]en_US
dc.item-language.isoengen_US
dc.item-rightsinfo:eu-repo/semantics/closedAccessen_US
dc.titleThe removal of copper ions from aqueous solutions using silica supports immobilized with 4-phenylacetophynone 4-aminobenzoylhydrazoneen_US
dc.item-typeconferenceObjecten_US
dc.contributor.departmenten_US
dc.contributor.departmentTempHatay, I., Selçuk University, Chemistry Department, 42070 Kampus, Konya, Turkey; Gup, R., Mugla University, Science and Art Faculty, Chemistry Department, Mugla, Turkey; Ersöz, M., Selçuk University, Chemistry Department, 42070 Kampus, Konya, Turkeyen_US
dc.relation.journalCHISA 2006 - 17th International Congress of Chemical and Process Engineeringen_US
dc.relation.publicationcategoryKonferans Öğesi - Uluslararası - Kurum Öğretim Elemanıen_US


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